Invention Grant
- Patent Title: High efficiency nanostructured photovoltaic device manufacturing
- Patent Title (中): 高效纳米结构光伏器件制造
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Application No.: US13574840Application Date: 2011-03-09
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Publication No.: US09117954B2Publication Date: 2015-08-25
- Inventor: Rizgar Jiawook
- Applicant: Rizgar Jiawook
- Applicant Address: SE Malmo
- Assignee: European Nano Invest AB
- Current Assignee: European Nano Invest AB
- Current Assignee Address: SE Malmo
- Agency: Renner, Otto, Boisselle, Sklar, LLP
- International Application: PCT/EP2011/053545 WO 20110309
- International Announcement: WO2011/110596 WO 20110915
- Main IPC: H01L33/04
- IPC: H01L33/04 ; H01L31/0352 ; H01L31/056 ; H01L31/0216 ; H01L31/055 ; H01L33/40 ; H01L33/50 ; H01L31/0236 ; H01L33/22

Abstract:
Photovoltaic and Light emitted diode devices comprise of epitaxial wafer of plurality of layers has been proposed. Quantum Dots are deposited onto the micro-nanostructure layer from the light incident direction to increasing light transmission to the active layer. Quantum dots deposited between the light source and the active layer, on the micro-nanostructure layer, to improve light excitation, since it can absorb wavelengths, which are not absorbed by the active layer, and the size and composition of quantum dots can determine its bandgap. A micro-nanostructured layer at the bottom of the PV wafer, which is produced by Molecular Beam Epitaxy (MBE), increases the internal light reflections in the active layer, which increases the efficiency of light absorption and that leads to a photocurrent enhancement.
Public/Granted literature
- US20120291862A1 HIGH EFFICIENCY NANOSTRUCTURED PHOTVOLTAIC DEVICE MANUFACTURING Public/Granted day:2012-11-22
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