Invention Grant
- Patent Title: Layout-optimized random mask distribution system and method
- Patent Title (中): 布局优化的随机蒙版分布系统和方法
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Application No.: US13750936Application Date: 2013-01-25
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Publication No.: US09118441B2Publication Date: 2015-08-25
- Inventor: Srdjan Coric , Steven D. Millman
- Applicant: Srdjan Coric , Steven D. Millman
- Applicant Address: US TX Austin
- Assignee: FREESCALE SEMICONDUCTOR, INC.
- Current Assignee: FREESCALE SEMICONDUCTOR, INC.
- Current Assignee Address: US TX Austin
- Agency: Schmeiser, Olsen & Watts LLP
- Main IPC: H04K1/00
- IPC: H04K1/00 ; H04L9/00 ; H04L9/08 ; H04N7/167

Abstract:
A data processing system includes a module for generating and distributing random masks to a number of cryptographic accelerators while providing for fewer total interconnects among the components generating the random masks. The module segments the tasks associated with generating random masks across a number of modules and blocks such that routing and timing problems can be minimized and layout can be optimized. A method for generating and distributing random masks to a number of cryptographic accelerators is also provided. The random masks are utilized by cryptographic accelerators to protect secret keys, and data associated with those keys, from discovery by unauthorized users.
Public/Granted literature
- US20140211937A1 LAYOUT-OPTIMIZED RANDOM MASK DISTRIBUTION SYSTEM AND METHOD Public/Granted day:2014-07-31
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