Invention Grant
- Patent Title: Brush cleaning system
- Patent Title (中): 刷子清洗系统
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Application No.: US13362635Application Date: 2012-01-31
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Publication No.: US09119464B2Publication Date: 2015-09-01
- Inventor: Fu-Ming Huang , Liang-Guang Chen , Han-Hsin Kuo , Chi-Ming Tsai , He Hui Peng
- Applicant: Fu-Ming Huang , Liang-Guang Chen , Han-Hsin Kuo , Chi-Ming Tsai , He Hui Peng
- Applicant Address: TW
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW
- Agency: Lowe Hauptman & Ham, LLP
- Main IPC: B08B3/00
- IPC: B08B3/00 ; A46B17/06 ; B08B1/00 ; A46B15/00
Abstract:
A brush cleaning system comprising: a plate comprising at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein the plate has a static charge on a surface thereof; and a machine configured to rotate a brush in contact with the static charged surface of the plate.
Public/Granted literature
- US20130192634A1 BRUSH CLEANING SYSTEM Public/Granted day:2013-08-01
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