Invention Grant
- Patent Title: Nanoparticle positioning technique
- Patent Title (中): 纳米粒子定位技术
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Application No.: US13612438Application Date: 2012-09-12
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Publication No.: US09120091B2Publication Date: 2015-09-01
- Inventor: Gurtej Sandhu
- Applicant: Gurtej Sandhu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Fletcher Yoder, P.C.
- Main IPC: H01L51/00
- IPC: H01L51/00 ; B01J37/34 ; B01J23/745 ; B01J23/755 ; B01J31/02

Abstract:
Embodiments of the present invention are generally directed to a method for disposing nanoparticles on a substrate. In one embodiment, a substrate having a plurality of recesses is provided. In this embodiment, a plurality of nanoparticles is also provided. The nanoparticles include a catalyst material coupled to one or more ligands, and these nanoparticles are disposed within respective recesses of the substrate. In some embodiments, the substrate is processed to form nanostructures, such as nanotubes or nanowires, within the recesses. Devices and systems having such nanostructures are also disclosed.
Public/Granted literature
- US20130005125A1 NANOPARTICLE POSITIONING TECHNIQUE Public/Granted day:2013-01-03
Information query
IPC分类: