Invention Grant
- Patent Title: Process for cleaning polycrystalline silicon chunks
- Patent Title (中): 清洗多晶硅块的工艺
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Application No.: US13546356Application Date: 2012-07-11
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Publication No.: US09120674B2Publication Date: 2015-09-01
- Inventor: Hanns Wochner , Thomas Gailer , Rudolf Kellner
- Applicant: Hanns Wochner , Thomas Gailer , Rudolf Kellner
- Applicant Address: DE Munich
- Assignee: Wacker Chemie AG
- Current Assignee: Wacker Chemie AG
- Current Assignee Address: DE Munich
- Agency: Caesar Rivise, PC
- Priority: DE102011080105 20110729
- Main IPC: B08B3/08
- IPC: B08B3/08 ; C01B33/037 ; G05D9/00

Abstract:
Disclosed is a process for cleaning polycrystalline silicon chunks in an acidic cleaning bath, wherein: (a) the cleaning includes several cleaning cycles, (b) a particular amount of acid is consumed in each cycle, (c) a computer-controlled dosage system integrator adds up those amounts of acid consumed in each cycle to give a current total consumption of acid in the bath, and (d) on attainment of a total consumption of acid in the bath corresponding to an optimal dosage of the dosage system, the dosage system supplies this optimal dosage of unconsumed acid withdrawn from a reservoir vessel to the bath. Another process for cleaning polycrystalline silicon chunks in an acidic cleaning bath includes an acid circuit in which acid is circulated, wherein the ratio of amount of acid circulated in liters to the mass of polysilicon chunks present in the bath in kg is greater than 10.
Public/Granted literature
- US20130025625A1 PROCESS FOR CLEANING POLYCRYSTALLINE SILICON CHUNKS Public/Granted day:2013-01-31
Information query
IPC分类: