Invention Grant
- Patent Title: Microlens array and scanning exposure device using same
- Patent Title (中): 微透镜阵列和扫描曝光装置使用相同
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Application No.: US14236319Application Date: 2012-07-27
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Publication No.: US09121986B2Publication Date: 2015-09-01
- Inventor: Michinobu Mizumura , Yoshio Watanabe
- Applicant: Michinobu Mizumura , Yoshio Watanabe
- Applicant Address: JP Yokohama-Shi, Kanagawa
- Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Yokohama-Shi, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2011-170206 20110803
- International Application: PCT/JP2012/069146 WO 20120727
- International Announcement: WO2013/018699 WO 20130207
- Main IPC: G02B3/08
- IPC: G02B3/08 ; G02B3/00 ; G03F7/20 ; G03F9/00

Abstract:
This microlens array comprises hexagonal field diaphragms in inverted-image-forming positions, i.e., microlenses, a plurality of which are arranged in the direction perpendicular to a direction of scanning, and from which rows of microlenses are configured. Further, for three rows of microlenses, microlens rows are arranged with offset by (a length S) in a direction perpendicular to the direction of scanning such that triangular portions of the hexagonal field diaphragms overlap in the direction of scanning. Furthermore, microlens row groups, which are configured from three microlens rows, are arranged with offset in the direction perpendicular to the direction of scanning in increments of a minute amount of shifting F (for example, 2 μm). Thereby, this scanning exposure device using a microlens array is capable of preventing exposure ununiformity even in the direction perpendicular to the direction of scanning.
Public/Granted literature
- US20140168622A1 MICROLENS ARRAY AND SCANNING EXPOSURE DEVICE USING SAME Public/Granted day:2014-06-19
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