Invention Grant
US09122151B2 Resist composition, resist film therefrom and method of forming negative pattern using the composition
有权
抗蚀剂组合物，抗蚀剂膜和使用该组合物形成负型图案的方法
- Patent Title: Resist composition, resist film therefrom and method of forming negative pattern using the composition
- Patent Title (中): 抗蚀剂组合物，抗蚀剂膜和使用该组合物形成负型图案的方法
-
Application No.: US13406165Application Date: 2012-02-27
-
Publication No.: US09122151B2Publication Date: 2015-09-01
- Inventor: Kana Fujii , Hidenori Takahashi , Fumiyuki Nishiyama
- Applicant: Kana Fujii , Hidenori Takahashi , Fumiyuki Nishiyama
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-042891 20110228
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; G03F7/039 ; G03F7/32 ; B23B3/10
Abstract:
A resist composition includes a resin (A) containing any of repeating units (a) of general formulae (I-a) and (I-b) below and any of repeating units (b) of general formula (II) below but containing substantially no repeating unit in which an alcoholic hydroxyl group is introduced, and any of compounds (B) of general formulae (III-a) and (III-b) below.
Public/Granted literature
- US20120219891A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING NEGATIVE PATTERN USING THE COMPOSITION Public/Granted day:2012-08-30
Information query
IPC分类:
