Invention Grant
- Patent Title: Composition of matter and molecular resist made therefrom
- Patent Title (中): 由其制成的物质和分子抗蚀剂的组成
-
Application No.: US14519924Application Date: 2014-10-21
-
Publication No.: US09122156B2Publication Date: 2015-09-01
- Inventor: Alex Philip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
- Applicant: Alex Philip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
- Agency: The Patent Practice of Szmanda & Shelnut, LLC
- Agent Charles R. Szmanda; James G. Shelnut
- Main IPC: G03F7/027
- IPC: G03F7/027 ; C07D487/04 ; C07D223/04

Abstract:
Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent; wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
Public/Granted literature
- US20150140491A1 Composition of Matter and Molecular Resist Made Therefrom Public/Granted day:2015-05-21
Information query
IPC分类: