Invention Grant
- Patent Title: Resist composition and method for forming resist pattern
- Patent Title (中): 抗蚀剂组合物和形成抗蚀剂图案的方法
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Application No.: US14085133Application Date: 2013-11-20
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Publication No.: US09122157B2Publication Date: 2015-09-01
- Inventor: Masatoshi Arai , Takahiro Dazai , Yoshiyuki Utsumi
- Applicant: Tokyo Ohka Kogyo Co., Ltd.
- Applicant Address: JP Kawasaki-Shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe, Martens, Olson & Bear LLP
- Priority: JP2012-258903 20121127; JP2013-041065 20130301
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/30 ; G03F7/20 ; G03F7/32

Abstract:
A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component which exhibits changed solubility in a developing solution by the action of an acid; and the base material component containing a resin component having a constituent unit derived from a compound represented by the following general formula (a0-1), at least two or more kinds of a constituent unit containing an acid dissociable group represented by the following general formula (a1-r-1) or (a1-r-2), and a constituent unit containing a lactone-containing, an —SO2-containing, or a carbonate-containing cyclic group; and a method for forming a resist pattern using the resist composition.
Public/Granted literature
- US20140147788A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN Public/Granted day:2014-05-29
Information query
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