Invention Grant
US09122158B2 Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part
有权
光固化树脂组合物，光固化型干膜，图案化工艺，保护膜和电气/电子部件
- Patent Title: Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part
- Patent Title (中): 光固化树脂组合物，光固化型干膜，图案化工艺，保护膜和电气/电子部件
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Application No.: US13932621Application Date: 2013-07-01
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Publication No.: US09122158B2Publication Date: 2015-09-01
- Inventor: Satoshi Asai
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2013-018067 20130201
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/38 ; G03F7/004
Abstract:
A photo-curable resin composition comprising a silicone-containing polymer, a photobase generator, a solvent, and optionally an epoxy resin crosslinker forms a coating which serves as a protective film for the protection of electric/electronic parts.
Public/Granted literature
Information query
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