Invention Grant
- Patent Title: Lithography method and device
- Patent Title (中): 平版印刷方法和装置
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Application No.: US14275600Application Date: 2014-05-12
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Publication No.: US09122168B2Publication Date: 2015-09-01
- Inventor: Durga Prasanna Panda
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: G03F1/48
- IPC: G03F1/48 ; H01L21/027 ; H01L21/033
Abstract:
Lithography methods and devices are shown that include a semiconductor structure such as a mask. Methods and devices are shown that include a pattern of mask features and a composite feature. Selected mask features include doubled mask features. Methods and devices shown may provide varied feature sizes (including sub-resolution) with a small number of processing steps.
Public/Granted literature
- US20140246756A1 LITHOGRAPHY METHOD AND DEVICE Public/Granted day:2014-09-04
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