Invention Grant
US09122170B2 Transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method 有权
传输光学系统,照明光学系统,曝光装置和装置的制造方法

  • Patent Title: Transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method
  • Patent Title (中): 传输光学系统,照明光学系统,曝光装置和装置的制造方法
  • Application No.: US13196535
    Application Date: 2011-08-02
  • Publication No.: US09122170B2
    Publication Date: 2015-09-01
  • Inventor: Naonori Kita
  • Applicant: Naonori Kita
  • Applicant Address: JP Tokyo
  • Assignee: NIKON CORPORATION
  • Current Assignee: NIKON CORPORATION
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff PLC
  • Priority: JP2010-173240 20100802
  • Main IPC: G03F7/20
  • IPC: G03F7/20
Transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method
Abstract:
According to one embodiment, a transmission optical system which guides light in a nearly parallel beam state emitted from an optical outlet port of a light source, to an optical inlet port of an exposure apparatus body and which injects the light in the nearly parallel beam state into the optical inlet port is provided with a condensing optical system which keeps the optical outlet port and the optical inlet port in an optical Fourier transform relation, and an angle distribution providing element which is arranged in an optical path between the optical outlet port and the condensing optical system and which provides an emergent beam with an angle distribution in a range larger than a range of an angle distribution of an incident beam.
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