Invention Grant
- Patent Title: Method of loading a substrate on a substrate table and lithographic apparatus and device manufacturing method
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Application No.: US13649696Application Date: 2012-10-11
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Publication No.: US09122174B2Publication Date: 2015-09-01
- Inventor: Jan-Jaap Kuit , Nick Snijders
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/52 ; G03F7/20
Abstract:
The invention relates to a method of loading a first object on a second object in a lithographic apparatus. The method includes: a) loading the first object on the second object, b) waiting a predetermined time interval and c) performing a relaxation action. The first object may be a substrate and the second object a substrate table. The first object may also be a substrate table and the second object a support structure, supporting the substrate table.
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