The present invention relates to an oxide sputtering target. By using the oxide sputtering target for formation of a protective film for an optical recording medium, a film, which has high storage stability and breakage resistance due to flexibility, can be deposited. Also, it can be utilized for direct-current sputtering and forms a less amount of particles during sputtering. The oxide sputtering target is made of an oxide sintered body including: with respect to a total content amount of metal compositions, 0.15 at % or more of one or more of Al, Ga, and In as a total content amount; 7 at % or more of Sn; and the balance Zn and inevitable impurities, wherein a total content amount of Al, Ga, In, and Sn is 36 at % or less.