Invention Grant
- Patent Title: Processing apparatus and device manufacturing method
- Patent Title (中): 加工装置及装置的制造方法
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Application No.: US13865911Application Date: 2013-04-18
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Publication No.: US09123760B2Publication Date: 2015-09-01
- Inventor: Shinichi Hirano , Mitsuji Marumo
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2008-197125 20080731
- Main IPC: H01L21/677
- IPC: H01L21/677 ; G03B27/58

Abstract:
A processing apparatus of the present invention processes for a wafer. The processing apparatus includes an XY stage which includes a wafer chuck which holds the wafer and an elevating device which rises relative to the wafer chuck to hold the wafer, and a wafer conveying robot hand which conveys the wafer from the XY stage at a wafer transfer position. The XY stage moves to change a direction at an angle between degree and degree via the wafer transfer position in a state where the elevating device rises relative to the wafer chuck. The wafer conveying robot hand has a shape which does not interfere with the XY stage which moves to change the direction at the angle when the wafer conveying hand is positioned at the wafer transfer position.
Public/Granted literature
- US20130230371A1 PROCESSING APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2013-09-05
Information query
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