Invention Grant
US09123797B2 Resin powder wafer processing utilizing a frame with a plurality of partitions
有权
利用具有多个隔板的框架的树脂粉末晶片处理
- Patent Title: Resin powder wafer processing utilizing a frame with a plurality of partitions
- Patent Title (中): 利用具有多个隔板的框架的树脂粉末晶片处理
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Application No.: US14542905Application Date: 2014-11-17
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Publication No.: US09123797B2Publication Date: 2015-09-01
- Inventor: Kazuma Sekiya , Tomotaka Tabuchi
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns and Crain, LTD.
- Priority: JP2013-240945 20131121
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/24 ; H01L21/78 ; H01L21/033 ; H01L21/311 ; H01L21/3065 ; H01L21/683 ; H01L23/544 ; H01L21/304

Abstract:
A wafer processing method for dividing a wafer into individual devices along a plurality of crossing division lines, including a frame preparing step of preparing a frame having a plurality of crossing partitions corresponding to the division lines of the wafer, a resin covering step of spreading a resin powder on the wafer and positioning the partitions of the frame in alignment with the division lines, thereby covering with the resin powder the regions of the wafer other than the regions corresponding to the division lines, a masking step of melting and curing the resin powder supplied to the wafer processed by the resin covering step and next removing the frame, thereby masking the regions other than the regions corresponding to the division lines, and an etching step of plasma-etching the wafer processed by the masking step to thereby divide the wafer into the individual devices along the division lines.
Public/Granted literature
- US20150140784A1 WAFER PROCESSING METHOD Public/Granted day:2015-05-21
Information query
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