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US09123805B2 Method to manufacture short channel trench MOSFET 有权
制造短通道沟槽MOSFET的方法

Method to manufacture short channel trench MOSFET
Abstract:
Aspects of the present disclosure describe a trench MOSFET with a channel length that may be controlled by counterdoping the body-drain junction to form a straggle region adjacent to the trenches. The channel length is defined between the straggle region at the bottom and a source region at the top. Both of the straggle region and the source region are of the same conductivity type though they may be different ion species.
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