Invention Grant
US09123810B2 Semiconductor integrated device including FinFET device and protecting structure
有权
半导体集成器件包括FinFET器件和保护结构
- Patent Title: Semiconductor integrated device including FinFET device and protecting structure
- Patent Title (中): 半导体集成器件包括FinFET器件和保护结构
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Application No.: US13920093Application Date: 2013-06-18
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Publication No.: US09123810B2Publication Date: 2015-09-01
- Inventor: Shih-Fang Hong , Po-Chao Tsao
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A semiconductor integrated device includes a substrate, a plurality of active fins, and a plurality of first protecting fins. The substrate includes an active region, and the active fins are positioned in the active region. The active region is surrounded by the first protecting fins. The active fins and the first protecting fins all extend along a first direction.
Public/Granted literature
- US20140367780A1 SEMICONDUCTOR INTEGRATED DEVICE Public/Granted day:2014-12-18
Information query
IPC分类: