Invention Grant
- Patent Title: Piezoelectric device and method for manufacturing piezoelectric device
- Patent Title (中): 压电元件及压电元件制造方法
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Application No.: US14516767Application Date: 2014-10-17
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Publication No.: US09123885B2Publication Date: 2015-09-01
- Inventor: Takashi Iwamoto
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: JP2009-250121 20091030
- Main IPC: H01L41/08
- IPC: H01L41/08 ; H03H3/02 ; H03H9/02 ; H03H9/05 ; H03H9/17 ; H01L41/053

Abstract:
A piezoelectric device includes a piezoelectric thin film formed by separating and forming a piezoelectric single crystal substrate, an inorganic layer formed on a back surface of the piezoelectric thin film, an elastic body layer disposed on a surface opposite to the piezoelectric thin film of the inorganic layer, and a support pasted to a surface opposite to the inorganic layer of the elastic body layer. In a membrane structure portion, the inorganic layer and the elastic body layer are disposed on the piezoelectric thin film through a gap layer. The elastic body layer reduces a stress caused by pasting the piezoelectric thin film including the inorganic layer and the support and has a certain elastic modulus. The inorganic layer is formed with a material having an elastic modulus higher than that of the elastic body layer and suppresses damping caused by disposing the elastic body layer.
Public/Granted literature
- US20150035413A1 PIEZOELECTRIC DEVICE AND METHOD FOR MANUFACTURING PIEZOELECTRIC DEVICE Public/Granted day:2015-02-05
Information query
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