Invention Grant
- Patent Title: Anodes including mesoporous hollow silicon particles and a method for synthesizing mesoporous hollow silicon particles
- Patent Title (中): 包含介孔中空硅颗粒的阳极和合成介孔中空硅颗粒的方法
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Application No.: US13828755Application Date: 2013-03-14
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Publication No.: US09123939B2Publication Date: 2015-09-01
- Inventor: Qiangfeng Xiao , Mei Cai
- Applicant: GM Global Technology Operations LLC
- Applicant Address: US MI Detroit
- Assignee: GM Global Technology Operations LLC
- Current Assignee: GM Global Technology Operations LLC
- Current Assignee Address: US MI Detroit
- Agency: Dierker & Associates, P.C.
- Main IPC: H01M4/134
- IPC: H01M4/134 ; H01M4/04 ; H01M4/1395 ; H01M4/38 ; H01M4/62

Abstract:
Anodes including mesoporous hollow silicon particles are disclosed herein. A method for synthesizing the mesoporous hollow silicon particles is also disclosed herein. In one example of the method, a silicon dioxide sphere having a silicon dioxide solid core and a silicon dioxide mesoporous shell is formed. The silicon dioxide mesoporous shell is converted to a silicon mesoporous shell using magnesium vapor. The silicon dioxide solid core, any residual silicon dioxide, and any magnesium-containing by-products are removed to form the mesoporous, hollow silicon particle.
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