Invention Grant
- Patent Title: Watermark and manufacturing method therefor
- Patent Title (中): 水印及其制造方法
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Application No.: US14082897Application Date: 2013-11-18
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Publication No.: US09124819B2Publication Date: 2015-09-01
- Inventor: Hsi-Chun Wang , Ya-Wen Cheng
- Applicant: National Taiwan Normal University
- Applicant Address: TW Taipei
- Assignee: NATIONAL TAIWAN NORMAL UNIVERSITY
- Current Assignee: NATIONAL TAIWAN NORMAL UNIVERSITY
- Current Assignee Address: TW Taipei
- Agency: Lowe Hauptman & Ham, LLP
- Priority: TW102120135A 20130606
- Main IPC: H04N1/40
- IPC: H04N1/40 ; H04N1/405 ; G06K15/00 ; H04N1/32 ; H04N1/00

Abstract:
A watermark and a manufacturing method therefor are provided. The watermark has a first region comprising amplitude modulation (AM) halftone dots and a second region comprising frequency modulation (FM) halftone dots, and each of the amplitude modulation halftone dots has ink portions and blank portions, each of which is located between the two ink portions in the same amplitude modulation halftone dot. The ink area percentage of the amplitude modulation halftone dots are dispersed by filling the blank portions into each of the amplitude modulation halftone dots, so that the density calibration of the amplitude modulation halftone dots and frequency modulation halftone dots can be omitted.
Public/Granted literature
- US20140362414A1 WATERMARK AND MANUFACTURING METHOD THEREFOR Public/Granted day:2014-12-11
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