Invention Grant
- Patent Title: Heat-treatable low-emissivity glass and a production method therefor
- Patent Title (中): 可热处理的低辐射玻璃及其制造方法
-
Application No.: US14235886Application Date: 2012-08-06
-
Publication No.: US09126862B2Publication Date: 2015-09-08
- Inventor: Ung Kil Kim , Dae Hoon Kwon , Youn Ki Jun
- Applicant: Ung Kil Kim , Dae Hoon Kwon , Youn Ki Jun
- Applicant Address: KR Seoul
- Assignee: LG HAUSYS, LTD.
- Current Assignee: LG HAUSYS, LTD.
- Current Assignee Address: KR Seoul
- Agency: Lowe Hauptman & Ham, LLP
- Priority: KR10-2011-0082383 20110818
- International Application: PCT/KR2012/006228 WO 20120806
- International Announcement: WO2013/024996 WO 20130221
- Main IPC: B32B17/06
- IPC: B32B17/06 ; B32B15/04 ; C03C17/36

Abstract:
A low-emissivity glass which is outstandingly durable and is heat treatable without any changes in its characteristics before and after the heat treatment; and a production method therefor. The heat-treatable low-emissivity glass according to the present invention is characterized in that it comprises: a sunlight-adjusting metal layer which is formed above a glass substrate; a first dielectric layer which is formed below the sunlight-adjusting metal layer; a second dielectric layer which is formed above the sunlight-adjusting metal layer; and an uppermost protective layer which is formed above the second dielectric layer, and in that the first dielectric layer has a structure obtained by the lamination of a lowermost dielectric layer comprising a metal oxide and a lower metal protective dielectric layer comprising a metal (oxy)nitride, and an advantage of the present invention is that there is no change in the characteristics of the low-emissivity glass even after heat treatment.
Public/Granted literature
- US20140193636A1 HEAT-TREATABLE LOW-EMISSIVITY GLASS AND A PRODUCTION METHOD THEREFOR Public/Granted day:2014-07-10
Information query