Invention Grant
- Patent Title: Photosensitive azobenzene derivative
- Patent Title (中): 光敏偶氮苯衍生物
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Application No.: US14361599Application Date: 2012-11-30
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Publication No.: US09126899B2Publication Date: 2015-09-08
- Inventor: Yasuo Norikane
- Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2011-263292 20111201
- International Application: PCT/JP2012/081215 WO 20121130
- International Announcement: WO2013/081155 WO 20130606
- Main IPC: C07C245/08
- IPC: C07C245/08 ; C09K9/02 ; C09J201/00 ; C09J11/06 ; C08K5/23

Abstract:
The present invention addresses the problem of providing with a simple production process and with high efficiency a new photosensitive azobenzene derivative which is capable of freely controlling phase transition by photostimulation, and the problem is solved by using an azobenzene derivative represented by general formula (1). (1) (In the formula, R1 and R6 are independently an alkoxyl group having 6-18 carbon atoms, R2-R5 and R7-R10 are independently a hydrogen atom or an alkyl group having 1-4 carbon atoms which may have branches, provided that not all of R2-R5 and R7-R10 are hydrogen).
Public/Granted literature
- US20140323704A1 PHOTOSENSITIVE AZOBENZENE DERIVATIVE Public/Granted day:2014-10-30
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