Invention Grant
US09127031B2 Bisamineazaallylic ligands and their use in atomic layer deposition methods
有权
双胺化碱配体及其在原子层沉积方法中的应用
- Patent Title: Bisamineazaallylic ligands and their use in atomic layer deposition methods
- Patent Title (中): 双胺化碱配体及其在原子层沉积方法中的应用
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Application No.: US13908359Application Date: 2013-06-03
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Publication No.: US09127031B2Publication Date: 2015-09-08
- Inventor: David Thompson , Jeffrey W. Anthis
- Applicant: David Thompson , Jeffrey W. Anthis
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C07F19/00
- IPC: C07F19/00 ; C07F15/00 ; C23C16/18 ; C23C16/455 ; C07F11/00 ; C07F13/00 ; C07F1/10 ; C07F1/12 ; C07C211/13 ; C07F7/28 ; C07F9/00
Abstract:
Methods for deposition of elemental metal films on surfaces using metal coordination complexes comprising bisamineazaallylic ligands are provided. Also provided are bisamineazaallylic ligands useful in the methods of the invention and metal coordination complexes comprising these ligands.
Public/Granted literature
- US20130267709A1 Bisamineazaallylic Ligands And Their Use In Atomic Layer Deposition Methods Public/Granted day:2013-10-10
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