Invention Grant
US09127113B2 Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same
有权
聚苯乙烯 - 聚丙烯酸酯嵌段共聚物，其制造方法和包含其的制品
- Patent Title: Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same
- Patent Title (中): 聚苯乙烯 - 聚丙烯酸酯嵌段共聚物，其制造方法和包含其的制品
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Application No.: US13472998Application Date: 2012-05-16
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Publication No.: US09127113B2Publication Date: 2015-09-08
- Inventor: Phillip Dene Hustad , Peter Trefonas, III , Frank Steven Bates , Marc Andrew Hillmyer , Justin Glenn Kennemur
- Applicant: Phillip Dene Hustad , Peter Trefonas, III , Frank Steven Bates , Marc Andrew Hillmyer , Justin Glenn Kennemur
- Applicant Address: US MA Marlborough US MI Midland US MN Minneapolis
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC,DOW GLOBAL TECHNOLOGIES LLC,UNIVERSITY OF MINNESOTA
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC,DOW GLOBAL TECHNOLOGIES LLC,UNIVERSITY OF MINNESOTA
- Current Assignee Address: US MA Marlborough US MI Midland US MN Minneapolis
- Agency: Cantor Colburn LLP
- Main IPC: C08L53/00
- IPC: C08L53/00 ; C08F299/04 ; C08F297/02
Abstract:
Disclosed herein is a block copolymer comprising a first block derived from a vinyl aromatic monomer; and a second block derived from an acrylate monomer; where a chi parameter that measures interactions between the first block and the second block is greater than or equal to about 0.05, when measured at 240° C. Disclosed herein too is a method comprising polymerizing a vinyl aromatic monomer to form a first block; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing an acrylate monomer; and where the block copolymer has a chi parameter of greater than or equal to about 0.05, when measured at 240° C.; where the chi parameter is a measure of interactions between the first block and the second block.
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