Invention Grant
- Patent Title: Magnetron sputtering coating device, a nano-multilayer film, and the preparation method thereof
- Patent Title (中): 磁控溅射镀膜装置，纳米多层膜及其制备方法
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Application No.: US13891309Application Date: 2013-05-10
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Publication No.: US09127347B2Publication Date: 2015-09-08
- Inventor: Gong Jin , Jiangping Tu , Lingling Li , Gang Wang , Meina Wang
- Applicant: BEIJING ZHONGAO HUICHENG BIOLOGY-TECH MATERIAL CO., LTD.
- Applicant Address: CN Beijing
- Assignee: ZhongAo HuiCheng Technology Co., Ltd.
- Current Assignee: ZhongAo HuiCheng Technology Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: CN201210151152 20120515; CN201220218296U 20120515
- Main IPC: C23C14/35
- IPC: C23C14/35 ; C23C14/16 ; C23C14/02 ; C23C14/06 ; C23C14/34 ; C23C14/50 ; H01J37/32 ; H01J37/34 ; C23C14/56 ; A61L31/08
Abstract:
A magnetron sputtering coating device includes a deposition chamber, sputtering cathodes, a rotating stand within the deposition chamber, a support platform on the rotating stand, a first rotation system for driving the rotating stand to rotate around a central axis of the rotating stand, and a baffle fixed on the rotating stand. The sputtering cathodes are arranged around and perpendicular to the rotating stand.
Public/Granted literature
- US20130309486A1 MAGNETRON SPUTTERING COATING DEVICE, A NANO-MULTILAYER FILM, AND THE PREPARATION METHOD THEREOF Public/Granted day:2013-11-21
Information query
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