Invention Grant
- Patent Title: Filtered cathodic arc deposition apparatus and method
- Patent Title (中): 过滤阴极电弧沉积设备及方法
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Application No.: US14362301Application Date: 2012-11-30
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Publication No.: US09127354B2Publication Date: 2015-09-08
- Inventor: Mojmir Jilek, Sr. , Mojmir Jilek, Jr. , Olivier Coddet
- Applicant: Platit A.S.
- Applicant Address: CZ
- Assignee: Platit A.S.
- Current Assignee: Platit A.S.
- Current Assignee Address: CZ
- Agent George Pappas
- Priority: EP11191978 20111205
- International Application: PCT/EP2012/074147 WO 20121130
- International Announcement: WO2013/083495 WO 20130613
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/06 ; C23C14/08 ; C23C14/32 ; C23C14/35 ; C23C14/54 ; C23C14/56 ; H01J37/32 ; H01J37/34
Abstract:
Vacuum deposition apparatus including cathodic arc source for application of coatings on the substrate. Cathodic arc source comprises focusing magnetic source for generating magnetic field, arc cathode containing film forming material and anode. The focusing magnetic source is placed between arc cathode and substrate. Arc spot generated on the cathode evaporation surface is kept by the magnetic field lines in the place where the magnetic field lines are perpendicular to the cathode surface.
Public/Granted literature
- US20140332370A1 Filtered Cathodic Arc Deposition Apparatus and Method Public/Granted day:2014-11-13
Information query
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