Invention Grant
- Patent Title: System and method for sealing a vapor deposition source
- Patent Title (中): 用于密封气相沉积源的系统和方法
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Application No.: US13912820Application Date: 2013-06-07
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Publication No.: US09127357B2Publication Date: 2015-09-08
- Inventor: Robert A. Enzenroth , Joseph D. LoBue , Lawrence J. Knipp
- Applicant: Colorado State University Research Foundation
- Applicant Address: US CO Fort Collins
- Assignee: Colorado State University Research Foundation
- Current Assignee: Colorado State University Research Foundation
- Current Assignee Address: US CO Fort Collins
- Agency: Polsinelli PC
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/44 ; C23C14/24

Abstract:
A system and method for movably sealing a vapor deposition source is described. One embodiment includes a system for coating a substrate, the system comprising a deposition chamber; a vapor pocket located within the deposition chamber; and an at least one movable seal, wherein the at least one movable seal is configured to form a first seal with a first portion of a substrate, and wherein the first seal is configured to prevent a vapor from leaking past the first portion of the substrate out of the vapor pocket. In some embodiments, the movable seal may comprise a first flange, wherein the first flange forms a wall of the vapor pocket; and a second flange, wherein the second flange is configured to be movably disposed within a first groove of the source block.
Public/Granted literature
- US20130340243A1 SYSTEM AND METHOD FOR SEALING A VAPOR DEPOSITION SOURCE Public/Granted day:2013-12-26
Information query
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