Invention Grant
- Patent Title: Mold and production method for same, and anti-reflection film
- Patent Title (中): 模具和生产方法相同,并具有防反射膜
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Application No.: US13499736Application Date: 2010-10-08
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Publication No.: US09127371B2Publication Date: 2015-09-08
- Inventor: Akinobu Isurugi , Kiyoshi Minoura , Takao Imaoku
- Applicant: Akinobu Isurugi , Kiyoshi Minoura , Takao Imaoku
- Applicant Address: JP Osaka
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Osaka
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2009-235746 20091009
- International Application: PCT/JP2010/067753 WO 20101008
- International Announcement: WO2011/043464 WO 20110414
- Main IPC: C25D11/12
- IPC: C25D11/12 ; G02B1/118 ; C25D11/18

Abstract:
A moth-eye mold fabrication method of an embodiment of the present invention includes the steps of: (a) anodizing a surface of an aluminum film to form a porous alumina layer which has a plurality of minute recessed portions; (b) after step (a), bringing the porous alumina layer into contact with an etching solution, thereby enlarging the plurality of minute recessed portions of the porous alumina layer; and (c) after step (b), further anodizing the surface to grow the plurality of minute recessed portions, wherein a voltage applied in step (c) is higher than a voltage applied in step (a). According to an embodiment of the present invention, a mold fabrication method is provided which is capable of preventing formation of a plurality of tiny pores in one micropore.
Public/Granted literature
- US20120196090A1 MOLD AND PRODUCTION METHOD FOR SAME, AND ANTI-REFLECTION FILM Public/Granted day:2012-08-02
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