Invention Grant
- Patent Title: Mechanism for facilitating a dynamic electro-mechanical interconnect having a cavity for embedding electrical components and isolating electrical paths
- Patent Title (中): 用于促进具有用于嵌入电气部件并隔离电路径的空腔的动态机电互连的机构
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Application No.: US13629891Application Date: 2012-09-28
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Publication No.: US09128121B2Publication Date: 2015-09-08
- Inventor: Evan M. Fledell , Joe F. Walczyk , Dinia P. Kitendaugh
- Applicant: Evan M. Fledell , Joe F. Walczyk , Dinia P. Kitendaugh
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: G01R1/067
- IPC: G01R1/067 ; H02J15/00 ; H01R13/24

Abstract:
A mechanism is described for facilitating a dynamic electro-mechanical interconnect capable of being employed in a test system according to one embodiment. A method of embodiments of the invention may include separating, via a cavity, a first conductor of an interconnect from a second conductor of the interconnect, and isolating, via the cavity serving as a buffer, a first electrical path provided through the first conductor from a second electrical path provided through the second conductor.
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