A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including: a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid generator component (B) which generates an acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0) containing an acid decomposable group that exhibits increased polarity by the action of acid and a lactone-containing cyclic group, an —SO2— containing cyclic group or a carbonate-containing cyclic group, and the acid generator component (B) including an acid generator (B1) containing a compound having a nitrogen atom exhibiting a proton acceptor property and an acid generating site capable of generating an acid upon exposure in the same molecule thereof.