Invention Grant
- Patent Title: Resin composition for masks
- Patent Title (中): 口罩树脂组合物
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Application No.: US14237962Application Date: 2012-06-20
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Publication No.: US09128375B2Publication Date: 2015-09-08
- Inventor: Michiya Higuchi , Fumito Suzuki , Yoshio Sakai , Hisashi Marusawa
- Applicant: Michiya Higuchi , Fumito Suzuki , Yoshio Sakai , Hisashi Marusawa
- Applicant Address: JP Kyoto
- Assignee: GOO CHEMICAL CO., LTD.
- Current Assignee: GOO CHEMICAL CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Cheng Law Group, PLLC
- Priority: JP2011-176231 20110811
- International Application: PCT/JP2012/065784 WO 20120620
- International Announcement: WO2013/021734 WO 20130214
- Main IPC: G03F7/038
- IPC: G03F7/038 ; C08G59/40 ; G03F7/027 ; H05K3/28 ; C08G59/17 ; C08G59/42 ; C08L63/10 ; G03F7/032 ; H05K3/34

Abstract:
The present invention provides a resin composition for resist to be efficiently formed into a cured product with high properties of crack resistance, bulge resistance, protrusion resistance, and the like for filling a through-hole, a via hole, or the like with the cured product. The resin composition for masks in accordance with the present invention contains a first resin and a second resin. The first resin is prepared by an addition reaction of polybasic acid anhydride with an adduct of an ethylenically unsaturated compound having a carboxyl group and bifunctional epoxy resin. The second resin having; a group obtained by an addition reaction of an epoxy group with monocarboxylic acid; and a group obtained by addition reaction of an epoxy group with polybasic acid.
Public/Granted literature
- US20140186766A1 RESIN COMPOSITION FOR MASKS Public/Granted day:2014-07-03
Information query
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