Invention Grant
- Patent Title: Apparatus of photolithography process to liquid display panel and method thereof
- Patent Title (中): 液晶显示面板的光刻工艺及其方法
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Application No.: US13703357Application Date: 2012-08-16
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Publication No.: US09128386B2Publication Date: 2015-09-08
- Inventor: Hsiao-Hsien Chen
- Applicant: Hsiao-Hsien Chen
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. LTD.
- Current Assignee Address: CN Shenzhen
- Agent Mark M. Friedman
- Priority: CN201210290642 20120815
- International Application: PCT/CN2012/080256 WO 20120816
- International Announcement: WO2014/026368 WO 20140220
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02F1/13 ; G02F1/1337
Abstract:
The present invention discloses an apparatus of photolithography process to a liquid display panel, comprising: a platform, employed for loading the liquid display panel; a power supplying device, employed for supplying power to the liquid display panel; an ultraviolet light source supply device, employed for providing the ultraviolet light; a light distributing plate, employed for homogenizing the ultraviolet light. The present invention also discloses a method of photolithography process to a liquid display panel. The monomer can plenty reacts without damaging liquid crystal molecules according to the present invention.
Public/Granted literature
- US20150146181A1 APPARATUS OF PHOTOLITHOGRAPHY PROCESS TO LIQUID DISPLAY PANEL AND METHOD THEREOF Public/Granted day:2015-05-28
Information query
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