Invention Grant
US09129776B2 Differing boost voltages applied to two or more anodeless electrodes for plasma processing 有权
施加到两个或更多个阳极电极的等离子体处理的不同的升压电压

Differing boost voltages applied to two or more anodeless electrodes for plasma processing
Abstract:
This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.
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