Invention Grant
US09129776B2 Differing boost voltages applied to two or more anodeless electrodes for plasma processing
有权
施加到两个或更多个阳极电极的等离子体处理的不同的升压电压
- Patent Title: Differing boost voltages applied to two or more anodeless electrodes for plasma processing
- Patent Title (中): 施加到两个或更多个阳极电极的等离子体处理的不同的升压电压
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Application No.: US13867907Application Date: 2013-04-22
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Publication No.: US09129776B2Publication Date: 2015-09-08
- Inventor: Kenneth W. Finley , David Christie
- Applicant: Kenneth W. Finley , David Christie
- Applicant Address: US CO Fort Collins
- Assignee: Advanced Energy Industries, Inc.
- Current Assignee: Advanced Energy Industries, Inc.
- Current Assignee Address: US CO Fort Collins
- Agency: Neugeboren O'Dowd PC
- Main IPC: H05B39/00
- IPC: H05B39/00 ; H01J37/32 ; H05H1/48 ; H05H1/46

Abstract:
This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.
Public/Granted literature
- US20140117861A1 DIFFERING BOOST VOLTAGES APPLIED TO TWO OR MORE ANODELESS ELECTRODES FOR PLASMA PROCESSING Public/Granted day:2014-05-01
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