Invention Grant
- Patent Title: Cleaning method
- Patent Title (中): 清洗方法
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Application No.: US13518583Application Date: 2010-12-21
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Publication No.: US09129797B2Publication Date: 2015-09-08
- Inventor: Hiroto Tokoshima , Hiroshi Morita
- Applicant: Hiroto Tokoshima , Hiroshi Morita
- Applicant Address: JP Tokyo
- Assignee: KURITA WATER INDUSTRIES LTD.
- Current Assignee: KURITA WATER INDUSTRIES LTD.
- Current Assignee Address: JP Tokyo
- Agent Manabu Kanesaka
- Priority: JP2009-292510 20091224
- International Application: PCT/JP2010/072955 WO 20101221
- International Announcement: WO2011/078144 WO 20110630
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67

Abstract:
Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid.
Public/Granted literature
- US20120325927A1 CLEANING METHOD Public/Granted day:2012-12-27
Information query
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