Invention Grant
- Patent Title: Silicon controlled rectifier for high voltage applications
- Patent Title (中): 可控硅整流器用于高压应用
-
Application No.: US13958901Application Date: 2013-08-05
-
Publication No.: US09129809B2Publication Date: 2015-09-08
- Inventor: Yi-Feng Chang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01L23/552
- IPC: H01L23/552 ; H01L27/088 ; H01L29/74 ; H01L31/111 ; H01L23/62 ; H01L27/02

Abstract:
In a silicon-controlled rectifier, an anode region includes p-type anode well regions which are laterally surrounded by an n-type well region. A length of a p-type anode well region, as measured in a first direction, is greater than a width of the p-type anode well region, as measured in a second direction perpendicular to the first direction. A p-type well region meets the n-type well region at a junction, wherein the junction extends between the p-type well region and n-type well region in the second direction. A cathode region includes a plurality of n-type cathode well regions which are formed in the p-type well region. A length of an n-type cathode well region, as measured in the first direction, is greater than a width of the n-type cathode well region, as measured in the second direction.
Public/Granted literature
- US20150035007A1 SILICON CONTROLLED RECTIFIER FOR HIGH VOLTAGE APPLICATIONS Public/Granted day:2015-02-05
Information query
IPC分类: