Invention Grant
- Patent Title: Integrated inductor
- Patent Title (中): 集成电感
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Application No.: US14302880Application Date: 2014-06-12
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Publication No.: US09129843B1Publication Date: 2015-09-08
- Inventor: Stefan Flachowsky , Ralf Richter , Peter Javorka , Jan Hoentschel
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: H01F17/00
- IPC: H01F17/00 ; H01L49/02 ; H01L21/263 ; H01L21/762 ; H01L27/06 ; H01L29/06 ; B23K26/00 ; B23K26/38

Abstract:
A method of forming an inductor in a crystal semiconductor layer is provided, including generating an ion beam, directing the ion beam to a surface of the crystal semiconductor layer, applying a magnetic field to the ion beam to generate a helical motion of the ions and forming a three-dimensional helical structure in the crystal semiconductor layer by means of the ions of the ion beam.
Information query
IPC分类:
H | 电学 |
H01 | 基本电气元件 |
H01F | 磁体;电感;变压器;磁性材料的选择 |
H01F17/00 | 信号类型的固定电感器 |