Invention Grant
US09129843B1 Integrated inductor 有权
集成电感

Integrated inductor
Abstract:
A method of forming an inductor in a crystal semiconductor layer is provided, including generating an ion beam, directing the ion beam to a surface of the crystal semiconductor layer, applying a magnetic field to the ion beam to generate a helical motion of the ions and forming a three-dimensional helical structure in the crystal semiconductor layer by means of the ions of the ion beam.
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