Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US14357859Application Date: 2012-10-09
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Publication No.: US09129851B2Publication Date: 2015-09-08
- Inventor: Kenji Kouno , Shinji Amano
- Applicant: DENSO CORPORATION
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: JP2011-262055 20111130; JP2012-191627 20120831
- International Application: PCT/JP2012/006455 WO 20121009
- International Announcement: WO2013/080417 WO 20130606
- Main IPC: H01L29/00
- IPC: H01L29/00 ; H01L21/00 ; H01L29/10 ; H01L21/263 ; H01L29/32 ; H01L29/739 ; H01L29/08 ; H01L29/78 ; H01L29/861

Abstract:
In a semiconductor device having a vertical semiconductor element configured to pass an electric current between an upper electrode and a lower electrode, a field stop layer includes a phosphorus/arsenic layer doped with phosphorus or arsenic and a proton layer doped with proton. The phosphorus/arsenic layer is formed from a back side of a semiconductor substrate to a predetermined depth. The proton layer is deeper than the phosphorus/arsenic layer. An impurity concentration of the proton layer peaks inside the phosphorus/arsenic layer and gradually, continuously decreases at a depth greater than the phosphorus/arsenic layer.
Public/Granted literature
- US20140299915A1 SEMICONDUCTOR DEVICE Public/Granted day:2014-10-09
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