Invention Grant
US09129921B2 Method of manufacturing nitride semiconductor device, and burn-in apparatus 有权
氮化物半导体器件的制造方法以及老化装置

Method of manufacturing nitride semiconductor device, and burn-in apparatus
Abstract:
A method of manufacturing a nitride semiconductor device, the nitride semiconductor device having an input terminal, a drain terminal, a gate terminal, and an output terminal, includes a burn-in step in which the nitride semiconductor device is heated while inputting an RF signal to the input terminal, applying a drain voltage to the drain terminal, and applying a gate voltage to the gate terminal. The burn-in step is continued until the nitride semiconductor device exhibits a decrease in gate current.
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