Invention Grant
US09129966B2 Semiconductor device 有权
半导体器件

Semiconductor device
Abstract:
One wiring width of upper and lower wiring paths formed facing each other sandwiching an interlayer insulating film is large, and another wiring width is small; and the wiring widths of mutually adjacent wiring paths are formed to be large and small in alternating fashion on the same wiring layer.
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