Invention Grant
- Patent Title: Semiconductor device including semiconductor layer over insulating layer and manufacturing method thereof
- Patent Title (中): 包括绝缘层上的半导体层的半导体器件及其制造方法
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Application No.: US13402212Application Date: 2012-02-22
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Publication No.: US09130051B2Publication Date: 2015-09-08
- Inventor: Hideto Ohnuma , Atsuo Isobe , Hiromichi Godo
- Applicant: Hideto Ohnuma , Atsuo Isobe , Hiromichi Godo
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2007-058582 20070308
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L27/12 ; H01L21/02

Abstract:
A semiconductor device having a highly responsive thin film transistor (TFT) with low subthreshold swing and suppressed decrease in the on-state current and a manufacturing method thereof are demonstrated. The TFT of the present invention is characterized by its semiconductor layer where the thickness of the source region or the drain region is larger than that of the channel formation region. Manufacture of the TFT is readily achieved by the formation of an amorphous semiconductor layer on a projection portion and a depression portion, which is followed by subjecting the melting process of the semiconductor layer, resulting in the formation of a crystalline semiconductor layer having different thicknesses. Selective addition of impurity to the thick portion of the semiconductor layer provides a semiconductor layer in which the channel formation region is thinner than the source or drain region.
Public/Granted literature
- US20120146144A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2012-06-14
Information query
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