Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US14496617Application Date: 2014-09-25
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Publication No.: US09130063B2Publication Date: 2015-09-08
- Inventor: Hiroko Kawaguchi , Hiromichi Kumakura , Satoru Washiya , Toru Yoshie
- Applicant: Sanken Electric Co., LTD.
- Applicant Address: JP Niiza-shi, Saitama
- Assignee: Sanken Electric Co., LTD.
- Current Assignee: Sanken Electric Co., LTD.
- Current Assignee Address: JP Niiza-shi, Saitama
- Agency: Banner & Witcoff, Ltd.
- Priority: JP2013-204868 20130930
- Main IPC: H01L27/095
- IPC: H01L27/095 ; H01L29/47 ; H01L29/812 ; H01L31/07 ; H01L31/108 ; H01L29/872 ; H01L29/45 ; H01L21/283 ; H01L29/16

Abstract:
A semiconductor device having a main electrode connected to a first semiconductor region and a second semiconductor layer on a semiconductor substrate so that a pn-junction diode is formed with the first semiconductor region being interposed and a Schottky barrier diode is formed with the second semiconductor layer being interposed on a surface of the semiconductor substrate, the semiconductor device includes a first electrode configured to ohmic-contact the first semiconductor region; a second electrode configured to Schottky-contact the second semiconductor layer and not having a portion directly contacting the first electrode; and a conductive reaction suppression layer to suppress a reaction between a material configuring the first electrode and a material configuring the second electrode are provided on the surface of the semiconductor substrate, and the main electrode is electrically connected to the first electrode and the second electrode.
Public/Granted literature
- US20150091022A1 Semiconductor Device and Method of Manufacturing the Same Public/Granted day:2015-04-02
Information query
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