Invention Grant
US09130162B2 Resistance variable memory structure and method of forming the same 有权
电阻变量记忆结构及其形成方法

Resistance variable memory structure and method of forming the same
Abstract:
A semiconductor structure includes a resistance variable memory structure. The semiconductor structure also includes a dielectric layer. The resistance variable memory structure is over the dielectric layer. The resistance variable memory structure includes a first electrode disposed over the dielectric layer. The first electrode has a sidewall surface. A resistance variable layer has a first portion which is disposed over the sidewall surface of the first electrode and a second portion which extends from the first portion away from the first electrode. A second electrode is over the resistance variable layer.
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