Invention Grant
- Patent Title: Cylinder plating method and device
- Patent Title (中): 气缸电镀方法及装置
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Application No.: US13820641Application Date: 2011-09-27
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Publication No.: US09133561B2Publication Date: 2015-09-15
- Inventor: Tatsuo Shigeta
- Applicant: Tatsuo Shigeta
- Applicant Address: JP Chiba
- Assignee: THINK LABORATORY CO., LTD.
- Current Assignee: THINK LABORATORY CO., LTD.
- Current Assignee Address: JP Chiba
- Agency: McGlew and Tuttle, P.C.
- Priority: JP2010-220407 20100930
- International Application: PCT/JP2011/071961 WO 20110927
- International Announcement: WO2012/043514 WO 20120405
- Main IPC: C25D7/04
- IPC: C25D7/04 ; B41C1/18 ; C25D17/12 ; C25D7/06 ; C25D3/38 ; C25D17/00 ; C25D17/06

Abstract:
Provided are a plating method and a plating apparatus for a cylinder, which are capable of forming a plating layer having a uniform thickness in a technology of plating a cylinder, effectively preventing current concentration in cylinder end portions when being combined with a plating technology using divided insoluble electrodes, and performing plating with a more uniform thickness over the full length of a cylinder without generating defects such as rashes and pits irrespective of the size of the cylinder. The insoluble electrode has a shape in which a lower part thereof is curved inward, and is capable of rotating about an upper end thereof. Further, a thickness of a plating layer on an outer peripheral surface of the cylinder is adjusted by controlling an interval of closeness to the cylinder.
Public/Granted literature
- US20130161196A1 CYLINDER PLATING METHOD AND DEVICE Public/Granted day:2013-06-27
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