Invention Grant
- Patent Title: Path interference and generation device and method
- Patent Title (中): 路径干扰和生成装置及方法
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Application No.: US13520188Application Date: 2011-01-27
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Publication No.: US09134723B2Publication Date: 2015-09-15
- Inventor: Yoichi Nonaka , Hisaya Ishibashi , Takahiro Nakano
- Applicant: Yoichi Nonaka , Hisaya Ishibashi , Takahiro Nakano
- Applicant Address: JP Tokyo
- Assignee: HITACHI, LTD.
- Current Assignee: HITACHI, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Baker Botts L.L.P.
- Priority: JP2010-024360 20100205
- International Application: PCT/JP2011/051629 WO 20110127
- International Announcement: WO2011/096327 WO 20110811
- Main IPC: G05B19/19
- IPC: G05B19/19 ; G05B19/4069

Abstract:
In devices for generating a path of a tool of a processing machine by way of computer simulation, an NC program is created using a generated processing path. The NC program used to be corrected by verification of actually moving the processing machine. In contrast, the disclosed processing path generation device has been constituted to be provided with a means for calculating a closest distance and direction from a relationship of a position and posture between a tool and a work at an arbitrary point upon the processing path; a means for imparting a color determined by the closest distance and the direction calculated at the point upon the processing path; a means for panoramically displaying the color imparted to the work; and a means for correcting the relationship of the a position and posture between the tool and the work on the basis of information from a display device.
Public/Granted literature
- US20120283862A1 PROCESSING PATH GENERATION METHOD AND DEVICE FOR SAME Public/Granted day:2012-11-08
Information query
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