Invention Grant
- Patent Title: Integrated system and method of making the integrated system
- Patent Title (中): 集成系统和集成系统的制作方法
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Application No.: US13565709Application Date: 2012-08-02
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Publication No.: US09136213B2Publication Date: 2015-09-15
- Inventor: Thomas Kilger
- Applicant: Thomas Kilger
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H05K1/18
- IPC: H05K1/18 ; H01L23/498 ; H01L23/538 ; H01L25/10 ; H01L23/64 ; H01F27/28 ; H01L23/00 ; H05K1/16 ; H01L21/56

Abstract:
A system and method of manufacturing a system are disclosed. An embodiment of the system includes a first packaged component comprising a first component and a first redistribution layer (RDL) disposed on a first main surface of the first packaged component, wherein the first RDL includes first pads. The system further includes a second packaged component having a second component disposed at a first main surface of the second packaged component, the first main surface having second pads and a connection layer between the first packaged component and the second packaged component, wherein the connection layer connects a first plurality of the first pads with the second pads.
Public/Granted literature
- US20140036464A1 Integrated System and Method of Making the Integrated System Public/Granted day:2014-02-06
Information query