Invention Grant
US09136392B2 Semiconductor memory device and method for manufacturing the same 有权
半导体存储器件及其制造方法

Semiconductor memory device and method for manufacturing the same
Abstract:
According to one embodiment, the underlying film includes a memory region including a first trench and a peripheral region including a second trench. The stacked body includes conductive layers and insulating layers alternately stacked on the underlying film. The channel body is provided in a pair of first holes and the first trench. The first holes pierce the stacked body to be connected to the first trench. The memory film includes a charge storage film provided between a side wall of the first hole and the channel body, and between an inner wall of the first trench and the channel body. The conductor is provided in a pair of second holes and the second trench. The second holes pierce the stacked body to be connected to the second trench.
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