Invention Grant
- Patent Title: Semiconductor memory device and method for manufacturing the same
- Patent Title (中): 半导体存储器件及其制造方法
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Application No.: US13971220Application Date: 2013-08-20
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Publication No.: US09136392B2Publication Date: 2015-09-15
- Inventor: Sadatoshi Murakami
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-187625 20120828
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L29/788 ; H01L29/66 ; H01L29/792

Abstract:
According to one embodiment, the underlying film includes a memory region including a first trench and a peripheral region including a second trench. The stacked body includes conductive layers and insulating layers alternately stacked on the underlying film. The channel body is provided in a pair of first holes and the first trench. The first holes pierce the stacked body to be connected to the first trench. The memory film includes a charge storage film provided between a side wall of the first hole and the channel body, and between an inner wall of the first trench and the channel body. The conductor is provided in a pair of second holes and the second trench. The second holes pierce the stacked body to be connected to the second trench.
Public/Granted literature
- US20140061754A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-03-06
Information query
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