Invention Grant
- Patent Title: X-ray source with an immersion lens
- Patent Title (中): 具有浸没透镜的X射线源
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Application No.: US13373556Application Date: 2011-11-18
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Publication No.: US09142382B2Publication Date: 2015-09-22
- Inventor: David L. Adler , Wenbing Yun , Thomas Anthony Case
- Applicant: David L. Adler , Wenbing Yun , Thomas Anthony Case
- Applicant Address: US CA Pleasanton
- Assignee: Carl Zeiss X-ray Microscopy, Inc.
- Current Assignee: Carl Zeiss X-ray Microscopy, Inc.
- Current Assignee Address: US CA Pleasanton
- Agency: Houston & Associates, LLP
- Main IPC: H01J35/14
- IPC: H01J35/14 ; H01J35/08 ; H05G1/52

Abstract:
An x-ray source is described. During operation of the x-ray source, an electron source emits a beam of electrons. This beam of electrons is focused to a spot on a target by a magnetic focusing lens. In particular, the magnetic focusing lens includes an immersion lens in which a peak in a magnitude of an associated magnetic field occurs proximate to a plane of the target. Moreover, in response to receiving the beam of focused electrons, the target provides a transmission source of x-rays.
Public/Granted literature
- US20120269323A1 X-ray source with an immersion lens Public/Granted day:2012-10-25
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