Invention Grant
US09142413B2 Methods for growing a non-phase separated group-III nitride semiconductor alloy
有权
生长非相分离III族氮化物半导体合金的方法
- Patent Title: Methods for growing a non-phase separated group-III nitride semiconductor alloy
- Patent Title (中): 生长非相分离III族氮化物半导体合金的方法
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Application No.: US13883566Application Date: 2011-11-08
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Publication No.: US09142413B2Publication Date: 2015-09-22
- Inventor: Michael William Moseley , William Alan Doolittle
- Applicant: Michael William Moseley , William Alan Doolittle
- Applicant Address: US GA Atlanta
- Assignee: GEORGIA TECH RESEARCH CORPORATION
- Current Assignee: GEORGIA TECH RESEARCH CORPORATION
- Current Assignee Address: US GA Atlanta
- Agency: Troutman Sanders LLP
- Agent Ryan A. Schneider; Troy S. Kleckley
- International Application: PCT/US2011/059793 WO 20111108
- International Announcement: WO2012/064748 WO 20120518
- Main IPC: H01L21/3205
- IPC: H01L21/3205 ; H01L21/205 ; C30B23/02 ; C30B29/40 ; H01L21/02

Abstract:
Systems and methods for MBE growing of group-III Nitride alloys, comprising establishing an average reaction temperature range from about 250 C to about 850 C; introducing a nitrogen flux at a nitrogen flow rate; introducing a first metal flux at a first metal flow rate; and periodically stopping and restarting the first metal flux according to a first flow duty cycle. According to another embodiment, the system comprises a nitrogen source that provides nitrogen at a nitrogen flow rate, and, a first metal source comprising a first metal effusion cell that provides a first metal at a first metal flow rate, and a first metal shutter that periodically opens and closes according to a first flow duty cycle to abate and recommence the flow of the first metal from the first metal source. Produced alloys include AlN, InN, GaN, InGaN, and AlInGaN.
Public/Granted literature
- US20130244408A1 Systems And Methods For Growing A Non-Phase Separated Group-III Nitride Semiconductor Alloy Public/Granted day:2013-09-19
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