Invention Grant
- Patent Title: Mask and method for forming the same
- Patent Title (中): 面具及其形成方法
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Application No.: US14090923Application Date: 2013-11-26
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Publication No.: US09142806B2Publication Date: 2015-09-22
- Inventor: Tiansheng Ye
- Applicant: Xiamen Tianma Micro-Electronics Co., Ltd. , Tianma Micro-Electronics Co., Ltd.
- Applicant Address: CN Xiamen CN Shenzhen
- Assignee: Xiamen Tianma Micro-Electronics Co., Ltd.,Tianma Micro-Electronics Co., Ltd.
- Current Assignee: Xiamen Tianma Micro-Electronics Co., Ltd.,Tianma Micro-Electronics Co., Ltd.
- Current Assignee Address: CN Xiamen CN Shenzhen
- Agency: Alston & Bird LLP
- Priority: CN201310250635 20130621
- Main IPC: G03F1/20
- IPC: G03F1/20 ; G03F1/50 ; H01L51/56 ; C23C14/04 ; C23C16/04
Abstract:
A mask is disclosed. The mask includes at least one support base having at least one opening formed therein, where at least a portion of the boundary of the opening is tapered. The mask also includes at least one positioning layer disposed on the at least one support base, where at least one through opening corresponding to and aligned with the at least one opening is formed in the at least one positioning layer. In addition, at least a portion of the boundary of the through opening is tapered.
Public/Granted literature
- US20140374381A1 MASK AND METHOD FOR FORMING THE SAME Public/Granted day:2014-12-25
Information query
